Method of X-ray mapping analysis

Details Method of X-ray mapping analysis Method of X-ray mapping analysis

1994-10-19

1996-04-23

Porta, David P.

X-ray or gamma ray systems or devices

Specific application

Fluorescence

2503414, 2504923, 378 64, 378208, G01N 23223

Patent

active

055111033

ABSTRACT:
The sample stage is scanned in a grid pattern with a feed pitch finer than the width of the primary beams, and with X-ray intensities at each point as values, primary and secondary mapping data are prepared. In order to convert the shape and size of the primary beam into a size of each of the mapping data, a beam template is prepared in which portions irradiated with primary beam being"1" and portions not irradiated being "0". The background intensity is determined as a threshold value, and at the positions where the value of the primary mapping data is below the threshold value, beam template is overlaid on the secondary mapping data. Those values in the secondary mapping data corresponding to "1" portions of the beam template are replaced with "0", and this is performed over all the measured points, thereby data closely approximating the actual boundary of the element concerned is obtained on the secondary mapping data.

REFERENCES:
patent: 4152723 (1979-05-01), McMahon et al.
patent: 4556903 (1985-12-01), Blitchington et al.
patent: 5424841 (1995-06-01), Van Gelder et al.

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