Method of varying etch selectivities of a film

Details Method of varying etch selectivities of a film Method of varying etch selectivities of a film

2007-07-24

2007-07-24

Weiss, Howard (Department: 2814)

Semiconductor device manufacturing: process

Chemical etching

Liquid phase etching

C438S924000

Reexamination Certificate

active

10750045

ABSTRACT:
A method of patterning a crystalline film. A crystalline film having a degenerate lattice comprising first atoms in a first region and a second region is provided. Dopants are substituted for said first atoms in said first region to form a non-degenerate crystalline film in said first region. The first region and the second region are exposed to a wet etchant wherein the wet etchant etches the degenerate lattice in said second region without etching the non-degenerate lattice in the first region.

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