Method of vaporizing and ionizing metals for use in...

Details Method of vaporizing and ionizing metals for use in... Method of vaporizing and ionizing metals for use in...

2008-01-29

2008-01-29

Chen, Bret (Department: 1762)

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of substrate or post-treatment of coated substrate

C427S569000, C427S523000

Reexamination Certificate

active

10697506

ABSTRACT:
Techniques for vaporizing and handling a vaporized metallic element or metallic element salt with a heated inert carrier gas for further processing. The vaporized metallic element or salt is carried by an inert carrier gas heated to the same temperature as the vaporizing temperature to a heated processing chamber. The metal or salt vapor may be ionized (and implanted) or deposited on substrates. Apparatus for accomplishing these techniques, which include carrier gas heating chambers and heated processing chambers are also provided.

REFERENCES:
patent: 3968270 (1976-07-01), Hasegawa
patent: 4229260 (1980-10-01), Johnson et al.
patent: 4617203 (1986-10-01), Jergenson
patent: 4742022 (1988-05-01), Oren et al.
patent: 4833319 (1989-05-01), Knauer
patent: 4911351 (1990-03-01), Ishikawa et al.
patent: 5315121 (1994-05-01), Kluge et al.
patent: 5333495 (1994-08-01), Yamaguchi et al.
patent: 6200397 (2001-03-01), Allen
patent: 6265033 (2001-07-01), Hilliard
patent: 6387182 (2002-05-01), Horie et al.
patent: 6416862 (2002-07-01), Kogoi et al.
patent: 7084408 (2006-08-01), Kimball et al.
patent: 2003/0015657 (2003-01-01), Takada et al.

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