Method of vapor deposition

Details Method of vapor deposition Method of vapor deposition

1974-02-04

1976-01-20

Weiffenbach, Cameron K.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 91, 427250, 427404, C23C 1302

Patent

active

039340597

ABSTRACT:
A method of vapor depositing a material onto a substrate results in improved substrate step coverage by the material while keeping the substrate clean by minimizing the evaporation of contaminants onto the surface of the substrate. The method comprises depositing a first layer of material onto the substrate, while the substrate is at a first temperature, heating the substrate to a higher temperature, and then depositing a second layer while maintaining the substrate at the higher temperature.

REFERENCES:
patent: 2812411 (1957-11-01), Moles
patent: 3184329 (1965-05-01), Burns
patent: 3382568 (1968-05-01), Kuiper
patent: 3498818 (1970-03-01), Bahm et al.
patent: 3518506 (1970-06-01), Gates
patent: 3556837 (1971-01-01), Hammond
patent: 3567509 (1971-03-01), Kuiper
patent: 3594214 (1971-07-01), Helwig et al.
patent: 3620837 (1971-11-01), Leff et al.

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