Method of utilizing dual-layer photoresist to form black...

Details Method of utilizing dual-layer photoresist to form black... Method of utilizing dual-layer photoresist to form black...

2005-10-24

2010-06-29

Nguyen, Dung T. (Department: 2871)

Liquid crystal cells, elements and systems

Nominal manufacturing methods or post manufacturing...

C349S042000, C349S106000, C349S110000, C349S155000

Reexamination Certificate

active

07746443

ABSTRACT:
A method of utilizing dual-layer photoresist to form black matrixes and spacers on a control circuit substrate is provided. The dual-layer photoresist includes a layer of black resin and a layer of transparent photoresist. The black resin, having an optical density greater than three, is mainly used to achieve the effect of black matrix. The transparent photoresist is mainly used to satisfy the needed cell gap between two transparent substrates.

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