Method of utilizing dual-layer photoresist to form black...

Details Method of utilizing dual-layer photoresist to form black... Method of utilizing dual-layer photoresist to form black...

2005-10-25

2005-10-25

Chowdhury, Tarifur R. (Department: 2871)

Liquid crystal cells, elements and systems

Particular structure

Having significant detail of cell structure only

C349S106000, C349S155000, C349S156000, C349S187000

Reexamination Certificate

active

06958792

ABSTRACT:
A method of utilizing dual-layer photoresist to form black matrixes and spacers on a control circuit substrate is provided. The dual-layer photoresist is composed of a layer of black resin and a layer of transparent photoresist. The black resin, of which optical density is greater than three, is mainly used to achieve the effect of black matrix. The transparent photoresist is mainly used to satisfy the needed cell gap between two transparent substrates.

REFERENCES:
patent: 4810061 (1989-03-01), Nakanowatari et al.
patent: 5667920 (1997-09-01), Chiulli et al.
patent: 6466295 (2002-10-01), Hsieh
patent: 54-065053 (1979-05-01), None

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