Specialized metallurgical processes – compositions for use therei – Processes – Electrothermic processes
Patent
1975-07-24
1976-11-09
Andrews, M. J.
Specialized metallurgical processes, compositions for use therei
Processes
Electrothermic processes
55 20, 55227, 75 43, 75 25, C21B 1302
Patent
active
039908860
ABSTRACT:
The invention discloses a method and apparatus for conditioning the gases discharged from a cupola. The apparatus consists of three flow connected vessels comprising first the cupola with improved gas conditioning means therein, secondly, a water spray tower and thirdly, a baghouse dust collector. The improved gas conditioning method and apparatus comprises a movably mounted conduit and nozzle for spraying cooling water through the cupola charge door during the burn-down period of cupola operation when the bed gas is not used to pre-heat the new charges in the cupola. The cooling water is used instead of large quantities of dilution air to temper the discharge gas at this point. Therefore, by the improved method, during burn-down the temperature of the discharged gas can be maintained at slightly above the normal cupola operational temperature without requiring discharge ducts and dust collecion capacity for the additional dilution air. The elimination of the additional dilution air results in a corresponding decrease in the size and expense of the discharge ducts and the dust collecting system.
REFERENCES:
patent: 3497194 (1970-02-01), Hoff
patent: 3518817 (1970-07-01), Dellagnese et al.
patent: 3782074 (1974-01-01), Gardenier
The Cupola & Its Operation Am. Foundrymen Soc. 3d E. 1965 p. 85.
Andrews M. J.
Fuller Company
Thomson Frank H.
LandOfFree
Method of using cupola emission control system does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of using cupola emission control system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of using cupola emission control system will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1723721