Method of using a test reticle to optimize alignment of integrat

Details Method of using a test reticle to optimize alignment of integrat Method of using a test reticle to optimize alignment of integrat

1997-05-05

1999-04-27

Mathews, Alan A.

Photocopying

Projection printing and copying cameras

Step and repeat

356401, 430 22, G03B 2742, G03B 2732, G01B 1100, G03F 900

Patent

active

058984780

ABSTRACT:
A test reticle and alignment mark optimization method is provided for determining the optimal alignment mark size for the efficient and accurate alignment of process layers during integrated circuit manufacture. The test reticle includes a number of orthogonally arranged alignment marks of various types and sizes and one or more registration structures. The method involves the steps of determining an initial expected range of alignment mark sizes on the test reticle which are suitable for a particular application; applying the test reticle patter to test wafers; further processing the test wafers; measuring the alignment signals produced by scanning the alignment marks in the initial expected range; quantifying the alignment signal quality; and fitting the quantified alignment signal quality to a statistical model to determine a range of optimal alignment signal dimensions.

REFERENCES:
patent: 4962423 (1990-10-01), Yamada et al.
patent: 4963924 (1990-10-01), Gill et al.
patent: 5049925 (1991-09-01), Aiton et al.
patent: 5250983 (1993-10-01), Yamamura
patent: 5329334 (1994-07-01), Yim et al.
patent: 5408083 (1995-04-01), Hirukawa et al.
patent: 5440394 (1995-08-01), Nose et al.
patent: 5627624 (1997-05-01), Yim et al.

Affiliated with

Also associated with

Rating

Method of using a test reticle to optimize alignment of integrat does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of using a test reticle to optimize alignment of integrat, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of using a test reticle to optimize alignment of integrat will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-688722