Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – From phenol – phenol ether – or inorganic phenolate
Patent
1996-12-20
1997-11-18
Chu, John S.
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
From phenol, phenol ether, or inorganic phenolate
528145, 528155, C08G 804, G03F 7023
Patent
active
056888937
ABSTRACT:
The present invention provides methods for producing water insoluble, aqueous alkali soluble novolak resins having a precise and consistent molecular weight, by adjusting the concentration of Lewis base. A method is also provided for producing photoresist composition from such novolak resins and for producing semiconductor devices using such photoresist compositions.
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JP,A,04065415 Hitachi Chemical Co., Ltd. (see abstract) (C-952) (5312) and Patent Abstracts of Japan, vol. 16, No. 269 (C-952) (5312), Jun. 17, 1992.
Aubin Daniel P.
Dammel Ralph R.
Durham Dana L.
Rahman M. Dalil
Chu John S.
Hoechst Celanese Corporation
Sayko. Jr. Andrew F.
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