Method of unsticking components of micro-mechanical devices

Details Method of unsticking components of micro-mechanical devices Method of unsticking components of micro-mechanical devices

1994-06-21

1996-01-09

Silbaugh, Jan H.

Cleaning and liquid contact with solids

Processes

Combined

134 19, 134 26, 134 37, 134 40, 134 21, B08B 304, B08B 504, B08B 700

Patent

active

054825644

ABSTRACT:
A method of unsticking contacting elements (11, 17) of a micro-mechanical device (30). The device is exposed to either a low surface tension liquid with a surfactant (32) or to a supercritical fluid (62) so as to avoid damage to fragile components of the device (30). The exposure conditions are controlled so as to provide optimum results without damage to the device.

REFERENCES:
patent: 5302212 (1994-04-01), Desbiendras et al.
Edward Bok, Dieter Kelch, Kevin S. Schumacher, "Supercritical Fluids for Single Wafer Cleaning", Solid State Technology, Jun. 1992, pp. 117-120.
W. Dale Spall, "Supercritical Carbon Dioxide Precision Cleaning for Solvent and Waste Reduction", International Journal of Environmentally Conscious Design & Manufacturing, vol. 2, No. 1, 1993, pp. 81-86.
R. L. Alley, C. J. Cuan, R. T. Howe, and K. Komvopoulos (Alley et al.), "The Effect of Release-Etch Processing on Surface Microstructure Stiction", IEEE, 1992, pp. 202-207.
Theresa A. Core, W. K. Tsang, Steven J. Sherman, "Fabrication Technology for an Integrated Surface-Micromachined Sensor", Solid State Technology, Oct. 1993, pp. 34-47.
Gregory T. Mulhern, David S. Soane, and Roger T. Howe, "Supercritical Carbon Dioxide Drying of Microstructures", International Conference on Solid State Sensors and Actuators, 1993, pp. 296-299.

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