Method of treating waste gas

Details Method of treating waste gas Method of treating waste gas

1988-07-26

1989-08-29

Doll, John

Chemistry of inorganic compounds

Modifying or removing component of normally gaseous mixture

Halogenous component

423241, B01D 5302, B01D 5304, B01D 5334

Patent

active

048615781

ABSTRACT:
A method of treating a waste gas containing at least boron trichloride and chlorine comprises first treating the waste gas with a treating agent containing a magnesium compound by a dry process and then treating the waste gas with a treating agent containing a calcium compound by a dry process. Thus, it is possible to remove efficiently a chloride and chlorine containing gas from waste gas discharged from a dry etching process or other manufacturing process in the semiconductor industry. In addition, it is possible to reduce the amount of treating agent used, lengthen the treating agent replacing cycle, and facilitate the maintenance of the system.

REFERENCES:
patent: 3744976 (1973-07-01), Tongue
patent: 3847552 (1974-11-01), Hobgood et al.
patent: 4472363 (1984-09-01), Poller et al.
patent: 4594231 (1986-06-01), Nishino et al.
patent: 4673558 (1987-06-01), Senoue et al.

Affiliated with

Also associated with

Rating

Method of treating waste gas does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of treating waste gas, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of treating waste gas will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2236912