Method of treating surface of substrate with ice particles and h

Details Method of treating surface of substrate with ice particles and h Method of treating surface of substrate with ice particles and h

1990-07-03

1992-01-14

Chaudhuri, Olik

Fishing, trapping, and vermin destroying

437228, 437229, 437946, 134 2, 134 254, 134 31, 134 38, H01L 21304, H01L 21306

Patent

active

050810685

ABSTRACT:
The method of treating a surface of a substrate (12) comprises the steps of physically treating the surface by jetting hydrogen peroxide containing ice particles (28) onto the substrate surface, and chemically treating the substrate surface with hydrogen peroxide solution obtained by melting the hydrogen peroxide containing ice particles (28).

REFERENCES:
patent: 4631250 (1986-12-01), Hayashi
patent: 4747421 (1988-05-01), Hayashi
patent: 4820650 (1989-04-01), Nagae
Beyer, "Silicon Surface Cleaning Process", IBM Technical Disclosure Bulletin, vol. 20, No. 5, Oct. 1977, pp. 1746-1747.
Patent Abstract of Japan: M-760, Nov. 8, 1988, vol. 12, No. 419.

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