Method of treating phyllosilicates

Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

252378R, 423132, 501146, 501148, 502410, B01J 2012, C01B 3326, C04B 2002

Patent

active

049523880

ABSTRACT:
There is disclosed a method of treating phyllosilicate materials by exposing the materials to a source of hydrogen ions to hydrate hydroxyl ions on and in the phyllosilicate structure. The source of hydrogen ions may be a simple organic, or mineral, acid, preferably formic or hydrochloric acid. The hydrated phyllosilicate may then be dehydrated and delaminated by thermal treatment.

REFERENCES:
patent: 3414422 (1968-12-01), Ianicelli et al.
patent: 3531410 (1970-09-01), Taylor
patent: 3813346 (1974-05-01), Wada et al.
patent: 4400297 (1983-08-01), Cruz, Jr.
patent: 4676929 (1987-06-01), Rittler
patent: 4715987 (1987-12-01), Rittler
patent: 4786620 (1988-11-01), Rittler
patent: 4826628 (1989-05-01), Rittler
Berry et al., Mineralogy, W. H. Freeman and CO., 1959, pp. 469, 499, 504.
CRC Handbook of Chemistry and Physics, 62nd ed., West et al., eds. CRC Press, Inc., 1981, pp. D-125 to D-127.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of treating phyllosilicates does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of treating phyllosilicates, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of treating phyllosilicates will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1588694

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.