Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing
Patent
1989-09-11
1990-08-28
Russel, Jeffrey E.
Chemistry of inorganic compounds
Silicon or compound thereof
Oxygen containing
252378R, 423132, 501146, 501148, 502410, B01J 2012, C01B 3326, C04B 2002
Patent
active
049523880
ABSTRACT:
There is disclosed a method of treating phyllosilicate materials by exposing the materials to a source of hydrogen ions to hydrate hydroxyl ions on and in the phyllosilicate structure. The source of hydrogen ions may be a simple organic, or mineral, acid, preferably formic or hydrochloric acid. The hydrated phyllosilicate may then be dehydrated and delaminated by thermal treatment.
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Corning Incorporated
Janes Clinton S.
Peterson Milton M.
Russel Jeffrey E.
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