Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Nitrogen or nitrogenous component
Patent
1975-12-17
1977-08-23
Thomas, Earl C.
Chemistry of inorganic compounds
Modifying or removing component of normally gaseous mixture
Nitrogen or nitrogenous component
423242, 423243, 423351, 423512A, C01B 2100
Patent
active
040441016
ABSTRACT:
A method of removing NO.sub.x and SO.sub.2 from an exhaust gas containing NO.sub.x and SO.sub.2 which comprises contacting an exhaust gas containing NO.sub.x and SO.sub.2 with an aqueous solution containing M.sub.2 SO.sub.3, an iron ion and an aminopolycarboxylic acid to absorb NO.sub.x and SO.sub.2 in the aqueous solution and treating the resulting absorbing solution while preventing a contact of the solution with the exhaust gas, thereby to form M.sub.2 S.sub.2 O.sub.6 in the absorbing solution and reducing NO.sub.x to N.sub.2. The M.sub.2 S.sub.2 O.sub.6 formed in the absorbing solution can be easily removed by crystallization separation. With such method, NO.sub.x and SO.sub.2 can be removed from exhaust gases at high rates and the absorbing solution can be easily regenerated and recycled to the absorbing zone.
REFERENCES:
patent: 3923954 (1975-12-01), Petrey et al.
patent: 3932585 (1976-01-01), Moriguchi et al.
patent: 3984522 (1976-10-01), Saito et al.
patent: 3991161 (1976-11-01), Saitoh et al.
patent: 3992508 (1976-11-01), Saitoh et al.
Chem. Abstr. - vol. 83, 1975 - No. 197569.
Hisamatsu Tokuichi
Kitamura Taketsugu
Saito Takeshiro
Sekiya Takuzo
Takagi Hitoshi
Asahi Kasei Kogyo Kabushiki Kaisha
Thomas Earl C.
Wheelock Eugene T.
LandOfFree
Method of treating exhaust gases containing nitrogen oxides and does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of treating exhaust gases containing nitrogen oxides and , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of treating exhaust gases containing nitrogen oxides and will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2315768