Specialized metallurgical processes – compositions for use therei – Processes – Free metal or alloy reductant contains magnesium
Patent
1993-11-12
1995-06-27
Mai, Ngoclan T.
Specialized metallurgical processes, compositions for use therei
Processes
Free metal or alloy reductant contains magnesium
423592, 423 62, C01G 3100
Patent
active
054276039
ABSTRACT:
The starting material is a vanadium-containing residue, which contains at least 5 weight percent carbon on an anhydrous basis. The residue is thermally treated in a furnace a) at temperatures from 400.degree. to 700.degree. C. under an oxidizing atmosphere and an O.sub.2 partial pressure of at least 10.sup.-4 bar, measured within the region which is occupied by the residue, and/or b) at temperatures from 500.degree. to 1300.degree. C. under an O.sub.2 partial pressure not in excess of 10.sup.-2 bar, measured within the region which is occupied by the residue. A solids mixture which contains at least 5 weight percent vanadium oxide is withdrawn from the furnace. A multiple-hearth furnace or a rotary kiln or a fluidized bed reactor containing a stationary or circulating fluidized bed may be used as a furnace for the thermal treatment.
REFERENCES:
patent: 2769687 (1956-11-01), Porter et al.
patent: 3753681 (1973-08-01), Vojkovic
patent: 4035476 (1977-07-01), Ilmaier et al.
patent: 4203759 (1980-05-01), Metrailer et al.
patent: 4389378 (1983-06-01), McCorrister
patent: 4420464 (1983-12-01), Barclay
patent: 4443415 (1984-04-01), Queneau et al.
patent: 4477416 (1984-10-01), Goddard
patent: 4486400 (1984-12-01), Riley
patent: 4536374 (1985-08-01), McCorriston
patent: 4645651 (1987-02-01), Hahn et al.
patent: 4816236 (1989-03-01), Gardner
patent: 4965150 (1990-10-01), Dahn et al.
patent: 5277795 (1994-01-01), Thornhill et al.
Higman Christopher
Krishnan Venkita
Samant Gurudas
Sturm Peter
Dubno Herbert
Mai Ngoclan T.
Metallgesellschaft Aktiengesellschaft
Myers Jonathan
Norsk Hydro Technology A.S.
LandOfFree
Method of treating a vanadium-containing residue does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of treating a vanadium-containing residue, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of treating a vanadium-containing residue will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-284208