Method of treating a substrate in manufacturing a...

Details Method of treating a substrate in manufacturing a... Method of treating a substrate in manufacturing a...

2007-08-21

2007-08-21

Le, Thao P. (Department: 2818)

Semiconductor device manufacturing: process

Having magnetic or ferroelectric component

C438S906000, C257SE21665

Reexamination Certificate

active

11175386

ABSTRACT:
A method of treating a substrate in manufacturing a magnetoresistive memory cell includes performing a cleaning operation on the substrate using a mask layer as a protection layer for etching of a peripheral via. Further, an etch stop layer can used as a protection layer in a cleaning operation on the substrate.

REFERENCES:
patent: 6012469 (2000-01-01), Li et al.
patent: 6774418 (2004-08-01), Moore
patent: 2002/0067581 (2002-06-01), Hiramoto et al.
patent: 2003/0082912 (2003-05-01), Kezuka et al.
patent: 2003/0219912 (2003-11-01), Chen et al.
patent: 2006/0051967 (2006-03-01), Chang et al.

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