Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture
Reexamination Certificate
2006-04-21
2009-12-29
Vanoy, Timothy C (Department: 1793)
Chemistry of inorganic compounds
Modifying or removing component of normally gaseous mixture
Reexamination Certificate
active
07638106
ABSTRACT:
A method is described of treating a gas stream exhausted from an atomic layer deposition (ALD) process chamber to which two or more gaseous precursors are alternately supplied. Between the process chamber and a vacuum pump used to draw the gas stream from the chamber, the gas stream is conveyed to a gas mixing chamber, to which a reactant is supplied for reacting with one of the gaseous precursors to form solid material. The gas stream is then conveyed to a cyclone separator to separate solid material from the gas stream. By deliberately reacting a non-reacted precursor to form solid material upstream from the pump, reaction within the pump of the non-reacted precursor and a second non-reacted precursor subsequently drawn from the chamber by the pump can be inhibited.
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Aitchison Kenneth Allen
Bailey Christopher Mark
Engerran David
Galtry Michael Andrew
Hogle Richard A.
Chao Ting-Mao
Edwards Limited
Vanoy Timothy C
Zebrak Ira Lee
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