Method of transferring miniature pattern by using electron beam

Details Method of transferring miniature pattern by using electron beam Method of transferring miniature pattern by using electron beam

1997-03-17

1999-04-20

Codd, Bernard

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430296, 430396, 430 5, 430942, 2504923, G03C 500, G03F 900

Patent

active

058957367

ABSTRACT:
An electron beam lithography system radiates an electron beam uniform in beam current density through apertures formed in an aperture plate to an electron resist layer, and steps are formed in the outlet end portions of the apertures so as to decrease the beam current density of a peripheral portion of the incident electron beam, thereby preventing the electron resist layer from the proximity effect.

REFERENCES:
patent: 4393127 (1983-07-01), Greschner et al.
patent: 4855197 (1989-08-01), Zapka et al.
patent: 4957835 (1990-09-01), Aden

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