Radiation imagery chemistry: process – composition – or product th – Registration or layout process other than color proofing
Patent
1984-04-23
1986-05-27
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Registration or layout process other than color proofing
430296, 430311, 430394, 430396, G03F 900, G03C 500
Patent
active
045915407
ABSTRACT:
According to this process two partial patterns which, if superimposed upon each other in a predetermined alignment relative to each other yield the desired pattern, with elements of both partial patterns combining to form elements of the pattern, and these partial pattern elements overlapping sectionally, are projected with a suitable radiation onto the radiation-sensitive layers. Overlapping is achieved in that when designing the two partial patterns a pattern corresponding to the desired pattern is used as a basis in that the elements of this pattern are exposed to a negative windage, the negative windage pattern is subsequently partitioned into two negative windage patterns corresponding to the partial patterns, and finally the negative windage partial pattern elements are exposed to a positive windage to the desired size of the partial pattern elements.
The method is used in particular when a pattern is to be transferred by means of hole masks, and if it is necessary, e.g. because the pattern shows annular elements, to use instead of one mask only two complementary masks each comprising at least one part of the pattern.
REFERENCES:
patent: 3615466 (1971-10-01), Sahni
patent: 4426584 (1984-01-01), Bohlen et al.
patent: 4504558 (1985-03-01), Bohlen et al.
Bohlen Harald
Bretscher Erwin
Engelke Helmut
Greschner Johann
Nehmiz Peter
Dees Jos,e G.
International Business Machines - Corporation
Kittle John E.
Stoffel Wolmar J.
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