Method of thin film deposition using laser ablation

Details Method of thin film deposition using laser ablation Method of thin film deposition using laser ablation

1990-06-29

1991-09-17

Beck, Shrive

Coating processes

Electrical product produced

Welding electrode

427 42, 118726, 118730, 118 501, 118620, B05D 306, C23C 1600, C23C 1400

Patent

active

050494058

ABSTRACT:
A rotating cylindrical target surface is provided for the laser ablation process of depositing thin films on a substrate. The target is mounted in a vacuum chamber so that it may be rotated about the longitudinal axis of the cylindrical surface target and simultaneously translated along the longitudinal axis. A laser beam is focused by a cylindrical lens onto the target surface along a line that is at an angle with respect to the longitudinal axis to spread the plume of ablated material over a greater radial arc. The plume may be spread in the longitudinal direction by providing a concave or convex lateral target surface. The angle of incidence of the focused laser beam may be other than normal to the target surface to provide a more glancing geometry. Simultaneous roation about and translation along the longitudinal axis produce a smooth and even ablation of the entire cylindrical target surface and a steady evaporation plume. Maintaining a smooth target surface is useful in reducing undesirable splashing of particulates during the laser ablation process and thereby depositing high quality thin films.

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