Method of thermally spraying a lithographic substrate with a par

Printing – Planographic – Lithographic plate making – and processes of making or using...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

101458, 427453, C23C 410, B41N 108

Patent

active

058816453

ABSTRACT:
A method of making a light sensitive printing plate such as might be used in lithography, comprises creating a surface layer on substrate base material by depositing particulate coating material on the base material using a dry deposition technique, the surface layer being formed from particles whose size is less than about 15 .mu.m, and creating an image layer on the deposited surface layer so that the surface layer is located intermediate the base material and the image layers.

REFERENCES:
patent: 2032770 (1936-03-01), Rowell
patent: 2032779 (1936-03-01), Wescott
patent: 3511661 (1970-05-01), Rauner et al.
patent: 3742585 (1973-07-01), Wentzell
patent: 3839618 (1974-10-01), Muehlberger
patent: 3871881 (1975-03-01), Mikelsons
patent: 4301730 (1981-11-01), Heurich et al.
patent: 4328257 (1982-05-01), Muehlberger et al.
patent: 4391879 (1983-07-01), Fabian et al.
patent: 4507383 (1985-03-01), Tsuruta et al.
patent: 4526839 (1985-07-01), Herman et al.
patent: 4596189 (1986-06-01), Halpern et al.
patent: 4912824 (1990-04-01), Baran
patent: 4932319 (1990-06-01), Switall
patent: 4991501 (1991-02-01), Yokoyama et al.
patent: 5093180 (1992-03-01), Morgan
patent: 5332601 (1994-07-01), Varacalle, Jr. et al.
patent: 5382964 (1995-01-01), Schneider
Scharwachter, R., "Technik Und Anwendung Des Plasmaspritzen Im Vakuum", Wt Zeitschrift Fur Industriele Fertigung, vol. 67, pp. 321-325 (1977), Muchen, DE; and translation thereof.
Wolf, Philip C. "Neue Anwendungsgebiete Des Plasmaspritzens In Der Energietechnik", Warme, vol. 89., No. 3, pp. 42-45, Grafeling, DE (Jun. 1983); and translation thereof.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of thermally spraying a lithographic substrate with a par does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of thermally spraying a lithographic substrate with a par, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of thermally spraying a lithographic substrate with a par will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-808615

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.