Method of thermal processing a substrate with direct and...

Details Method of thermal processing a substrate with direct and... Method of thermal processing a substrate with direct and...

2008-07-15

2008-07-15

Evans, Geoffrey S (Department: 1793)

Electric heating

Metal heating

By arc

C219S121740, C219S121800, C438S487000

Reexamination Certificate

active

07399945

ABSTRACT:
Apparatus and methods for thermally processing a substrate with scanned laser radiation are disclosed. The apparatus includes a continuous radiation source and an optical system that forms an image on a substrate. The image is scanned relative to the substrate surface so that each point in the process region receives a pulse of radiation sufficient to thermally process the region.

REFERENCES:
patent: 4288678 (1981-09-01), La Rocca
patent: 4356375 (1982-10-01), Josephy et al.
patent: 4527043 (1985-07-01), Hashiura et al.
patent: 4734912 (1988-03-01), Scerbak et al.
patent: 4761786 (1988-08-01), Baer
patent: 4908493 (1990-03-01), Susemihl
patent: 5057664 (1991-10-01), Johnson et al.
patent: 6166817 (2000-12-01), Kuroda
patent: 6208673 (2001-03-01), Miyake
patent: 6366308 (2002-04-01), Hawryluk et al.
patent: 6531680 (2003-03-01), Tomlinson et al.
patent: 6531681 (2003-03-01), Markle et al.
patent: 6717105 (2004-04-01), Okamoto et al.
patent: 6747245 (2004-06-01), Talwar et al.
patent: 2002/0137311 (2002-09-01), Timans
Sears et al., University Physics, Mar. 1977, Addison-Wesley Publishing company, 5thedition, pp. 645-646.
Naem, Boothroyd, Calder,CW Laser Annealed Small-Geometry NMOS Transistors, Mat. Res. Soc. Symp. Proc. vol. 23 (1984) pp. 229-234.
Goetzlich, Tsien, Ryssel,Relaxation Behavior of Metastable AS and P Concentrations in SI After Pulsed and CW Laser Annealing, Mat. Res. Soc. Symp. Proc. vol. 23 (1984) pp. 235-240.

Affiliated with

Also associated with

Rating

Method of thermal processing a substrate with direct and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of thermal processing a substrate with direct and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of thermal processing a substrate with direct and... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2757256