Optics: measuring and testing – Plural test
Reexamination Certificate
2009-03-05
2010-06-22
Geisel, Kara E (Department: 2877)
Optics: measuring and testing
Plural test
Reexamination Certificate
active
07742156
ABSTRACT:
An optical material for lithographic applications is selected from crystal materials by a testing method. The crystal materials are preferably quartz and/or alkali or alkaline earth halides, especially fluorides, or mixed crystals. The testing method includes three tests to measure irreversible radiation damage: 1) the optical material is irradiated with ultraviolet radiation at 193 nm and the non-intrinsic fluorescence intensity at 740 nm is measured; 2) the optical material is irradiated with high energy density laser light and a change in respective absorptions before and after irradiation at 385 nm is measured; and 3) the optical material is irradiated with an X-ray or radioactive source to form all possible color centers and a difference of respective surface integrals of corresponding absorption spectra in ultraviolet spectral and/or visible spectral regions is measured before and after irradiation.
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Martin Regina
Parthier Lutz
Poehl Karin
Von Der Goenna Gordon
Geisel Kara E
Schott AG
Striker Michael J.
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