Method of synthetic diamond ablation with an oxygen plasma and s

Details Method of synthetic diamond ablation with an oxygen plasma and s Method of synthetic diamond ablation with an oxygen plasma and s

1995-05-05

1998-01-27

Rose, Robert A.

Abrading

Abrading process

Glass or stone abrading

451 54, 51295, 125 3001, B24B 100

Patent

active

057116989

ABSTRACT:
A method for ablating a synthetic diamond having a pitted surface includes applying a colloidal graphite to the surface of the diamond and subjecting it to an oxygen plasma so that preferably approximately 50 microns are removed from the surface of the synthetic diamond. The resulting surface of the diamond is virtually pit free. Preferably, the diamond is then mechanically lapped for finishing.

REFERENCES:
patent: 5472370 (1995-12-01), Malshe et al.
Presented at Diamond Films '95, Barcelona, 1995, "ECR Plasma Polishing of CVD Diamond Films", H. Buchkremer-Hermanns, C. Long, H. WeiB, Laboratory of Surface Engineering, Institute of Materials Technology, University of Siegen Paul-Bonatz Str. 9-11, 57068 Siegen, Germany, pp. 1-6.

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