Method of surface crystallizing quartz

Details Method of surface crystallizing quartz Method of surface crystallizing quartz

1975-09-25

1978-07-25

Lindsay, Jr., Robert L.

Glass manufacturing

Processes

Devitrifying glass or vitrifying crystalline glass

65 30R, 65111, C03C 2100

Patent

active

041026667

ABSTRACT:
Quartz glass element, such as a diffusion tube useful in the production of semiconductor elements, capable of forming an outer layer of uniformly fine crystalline silica such as cristobalite or tridymite when heated to a temperature at which such crystalline silica forms containing crystallization promoting nuclei having a rate of diffusion in quartz glass less than that of sodium at elevated temperatures. Such nuclei are preferably present in the outer half of the element wall. When the quartz glass element is exposed to elevated temperatures, the nuclei promotes the formation of the outer layer of uniformly fine crystalline silica which imparts thermal dimensional stability for extended periods of use at elevated temperatures.

REFERENCES:
patent: 3116137 (1963-12-01), Vasilus et al.
patent: 3454386 (1969-07-01), Ernsberger
patent: 3464807 (1969-09-01), Pressau
patent: 3464880 (1969-09-01), Rinehart
patent: 3490888 (1970-01-01), Strong
patent: 3490984 (1970-01-01), Petticrew et al.
patent: 3499773 (1970-03-01), Petticrew et al.
patent: 3504819 (1970-04-01), Veres
patent: 3516810 (1970-06-01), Ivey et al.
patent: 3524748 (1970-08-01), Beal
patent: 3565595 (1971-02-01), Gaskell et al.
patent: 3957476 (1976-05-01), Rau
"Handbook of Glass Manufacture," vol. II, Fay V. Tooley - Ogden Pub. Co., New York, 1960, pp. 192-199.

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