Method of suppressing beam position drift, method of...

Details Method of suppressing beam position drift, method of... Method of suppressing beam position drift, method of...

2009-02-11

2011-11-01

Kim, Robert (Department: 2881)

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

C250S397000, C250S492300, C250S492200, C250S491100, C250S307000, C250S308000, C250S309000, C250S311000, C250S3960ML

Reexamination Certificate

active

08049181

ABSTRACT:
A lithography method and system have means for determining a convergence value dcfrom a relation of beam current to beam position drift (or beam dimension drift) produced in the past; means for finding a beam current i(t) as a function of the convergence value dcof beam position drift (or beam dimension drift), a measured value dmof beam position drift (or beam dimension drift), a gain constant g, and a convergence value c of beam position drift (or beam dimension drift) per unit beam current and using an equation given by i(t)={(1+g)·dc−g·dm(t)}/c; means for making a check regarding dmand dcas to whether dmapproaches dcand, thus, a relationship given by |dm−dc|<ε holds, where ε is a positive number providing a decision criterion under the condition where the gain constant g of the beam current i(t) satisfies a relationship given by g>0.

REFERENCES:
patent: 5130550 (1992-07-01), Nakamura et al.
patent: 5315123 (1994-05-01), Itoh et al.
patent: 5892237 (1999-04-01), Kawakami et al.
patent: 6436594 (2002-08-01), Tokunaga
patent: 6437347 (2002-08-01), Hartley et al.
patent: 6573516 (2003-06-01), Kawakami

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