Method of supplying polishing liquid

Details Method of supplying polishing liquid Method of supplying polishing liquid

2007-10-30

2010-11-09

Rachuba, Maurina (Department: 3727)

Abrading

Precision device or process - or with condition responsive...

Computer controlled

C451S041000, C451S051000, C451S060000

Reexamination Certificate

active

07828625

ABSTRACT:
The present invention relates to a method of supplying the polishing liquid by periodically interrupt the supply of the polishing liquid, thus avoid over-supply or wastage of the polishing liquid. Hence, the consumption of the polishing liquid can be decreased and the production cost can be lower.

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patent: 2003/0143924 (2003-07-01), Chen et al.

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