Method of stripping photoresist with composition containing inhi

Details Method of stripping photoresist with composition containing inhi Method of stripping photoresist with composition containing inhi

1995-07-11

1996-09-17

McGinty, Douglas J.

Cleaning and liquid contact with solids

Processes

Paints, varnishes, lacquers, or enamels, removal

134 40, 134 2, 510176, 510401, 510402, C23G 5036, C23G 114, C23G 118, B08B 308

Patent

active

055564828

ABSTRACT:
Organic stripping composition for photoresists comprising organic polar solvents and basic amines which includes an inhibitor which forms a coordination complex with a metal.

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