Method of stripping photoresist

Details Method of stripping photoresist Method of stripping photoresist

1977-11-07

1980-05-13

Scovronek, Joseph

Cleaning and liquid contact with solids

Processes

For metallic, siliceous, or calcareous basework, including...

134 29, 134 38, C03C 2300, B08B 700, B08B 3000

Patent

active

042027039

ABSTRACT:
A solution of tetramethylammonium hydroxide and a surfactant in a lower alcohol solubilizes photoresist films without attacking materials found in integrated circuit devices so that a subsequent 1,1,1-trichloroethane rinse completely removes the photoresist.

REFERENCES:
patent: 2445064 (1948-07-01), Hall et al.
patent: 2710843 (1955-06-01), Stebleton
patent: 3673099 (1972-06-01), Corby et al.
patent: 3796602 (1974-03-01), Briney
patent: 3813309 (1974-05-01), Bakos et al.
patent: 3877474 (1975-04-01), Urssing et al.
patent: 3980587 (1976-09-01), Sullivan
patent: 3988256 (1976-10-01), Vandermey et al.
patent: 4089704 (1978-05-01), Heiss, Jr. et al.

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