Method of step-and-flash imprint lithography

Details Method of step-and-flash imprint lithography Method of step-and-flash imprint lithography

2011-04-19

2011-04-19

Fletcher, III, William Phillip (Department: 1715)

Coating processes

Nonuniform coating

Deforming the base or coating or removing a portion of the...

C427S510000, C427S515000, C427S355000, C427S387000

Reexamination Certificate

active

07927664

ABSTRACT:
The present invention relates to a method for using compositions comprising poly-oxycarbosilane in step and flash imprint lithography. The imprinting compositions comprise a poly-oxycarbosilane polymer and a pore generator.

REFERENCES:
patent: 5602060 (1997-02-01), Kobayashi et al.
patent: 5895263 (1999-04-01), Carter et al.
patent: 6171687 (2001-01-01), Leung et al.
patent: 6613834 (2003-09-01), Nakata et al.
patent: 6730617 (2004-05-01), Carter
patent: 6780498 (2004-08-01), Nakata et al.
patent: 6809041 (2004-10-01), Interrante et al.
patent: 2002/0064965 (2002-05-01), Wu
patent: 2004/0000715 (2004-01-01), Interrante et al.
patent: 2004/0137241 (2004-07-01), Lin et al.
patent: 2005/0194619 (2005-09-01), Edelstein et al.
patent: 2005/0202350 (2005-09-01), Colburn et al.
patent: 2006/0084282 (2006-04-01), Dubois et al.
patent: 2007/0027287 (2007-02-01), Akiyama et al.
patent: 2007/0031687 (2007-02-01), Akiyama et al.
patent: 2007/0148974 (2007-06-01), Uh et al.
Colburn et al., “Step and Flash Imprint Lithography: A New Approach to High-Resolution Patterning,” Proceedings of SPIE's 24th International Symposium on Microlithography: Emerging Lithographic Technologies III, vol. 3676, Mar. 1999.
Stewart et. al. Direct Imprinting of Dielectric Materials for Dual Damascene ProcessingProceedings of SPIE vol. 5751 p. 210 (2005).

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