X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1998-12-18
2000-08-22
Porta, David P.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 71, G01N 2300
Patent
active
061084018
ABSTRACT:
A method of determining the concentrations of the constituents in a mixture of substances by way of an X-ray diffractogram of the mixture. The fundamental difficulty that it is not possible to determine the entire power spectrum (PS) of the diffraction is avoided by making a suitable estimate of the PS on the basis of the diffractions that can be observed. Using an estimate of the dispersive power of the individual atoms in the unity cells of the constituents and the PS, the absolute intensities are determined from the relative intensities and on the basis thereof the concentrations of the constituents in the mixture are determined.
REFERENCES:
patent: 3961186 (1976-06-01), Leunbach
patent: 4592082 (1986-05-01), Pawloski
patent: 4991191 (1991-02-01), Suryanarayanan
patent: 5812630 (1998-09-01), Blaffert
"A Method of Quantitative Phase Analysis Without Standards", by L.S. Zevin, J. Appl. Cryst., vol. 10, (1977) pp. 147-150.
International Tables for Crystallography, vol. C, 1992, Section 6.1, p. 476 .
Piotrowski Tony E.
Porta David P.
U.S. Philips Corporation
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