Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
Reexamination Certificate
2005-02-08
2005-02-08
Vinh, Lan (Department: 1765)
Semiconductor device manufacturing: process
Chemical etching
Liquid phase etching
C438S750000, C438S751000, C216S108000
Reexamination Certificate
active
06852641
ABSTRACT:
A method of spiking a mixed acid liquid in a reactor is performed under three modes of control, a based-on-charge mode control, a based-on-time mode control, and a based-on-time-and-charge mode control. In the based-on-charge mode control, spike timing and spiking amount of an acid liquid are set for each lot of product. In the based-on-time mode control, the spike timing and the spiking amount of the acid liquid are set for each timing point. In the based-on-time-and-charge mode control, the spike timing and the spiking amount of an acid liquid are set for each lot of product and each timing point. Thereby, a concentration of the mixed acid liquid is controlled at a targetlevel.
REFERENCES:
patent: 5810940 (1998-09-01), Fukazawa et al.
patent: 6132522 (2000-10-01), Verhaverbeke et al.
Jan Jia-Shing
Ni Chih-Jung
Jianq Chyun IP Office
Vinh Lan
Winbond Electronics Corp.
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