Method of spiking mixed acid liquid in reactor

Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching

Reexamination Certificate

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Details

C438S750000, C438S751000, C216S108000

Reexamination Certificate

active

06852641

ABSTRACT:
A method of spiking a mixed acid liquid in a reactor is performed under three modes of control, a based-on-charge mode control, a based-on-time mode control, and a based-on-time-and-charge mode control. In the based-on-charge mode control, spike timing and spiking amount of an acid liquid are set for each lot of product. In the based-on-time mode control, the spike timing and the spiking amount of the acid liquid are set for each timing point. In the based-on-time-and-charge mode control, the spike timing and the spiking amount of an acid liquid are set for each lot of product and each timing point. Thereby, a concentration of the mixed acid liquid is controlled at a targetlevel.

REFERENCES:
patent: 5810940 (1998-09-01), Fukazawa et al.
patent: 6132522 (2000-10-01), Verhaverbeke et al.

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