Method of solder bonding and power semiconductor device manufact

Active solid-state devices (e.g. – transistors – solid-state diode – Housing or package – Insulating material

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Details

2281231, 2281241, 228205, H01L 2158

Patent

active

057675775

ABSTRACT:
A method of solder bonding suitable for a body having a large bonding surface area including the following steps of cleaning off the bonding surfaces in vacuum chamber by impinging accelerated particles such as argon ions through reverse spattering; then covering with an oxidation inhibiting thin silver film over the cleaned off bonding surfaces through spattering; further sandwiching a cleaned off solder foil between the bonding surfaces covered with the oxidation inhibiting thin sliver film; and heating the solder foil in vacuum upto the melting temperature thereof to complete the bonding, whereby defects in the solder bonding is reduced downto about 1/25 and life time of the solder bonding which is affected by thermal fatigue is prolonged twice in comparison with a conventional solder bonding method, thereby reliability of the solder bonding is greatly improved.

REFERENCES:
patent: 4709844 (1987-12-01), Sekiguchi et al.
patent: 4921157 (1990-05-01), Dishon et al.
patent: 5182628 (1993-01-01), Izawa et al.
patent: 5377902 (1995-01-01), Hayes

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