X-ray or gamma ray systems or devices – Specific application – Holography or interferometry
Patent
1998-03-11
1999-11-16
Church, Craig E.
X-ray or gamma ray systems or devices
Specific application
Holography or interferometry
378210, G03H 500
Patent
active
059870923
ABSTRACT:
A method for inspecting masks used in x-ray lithography is described. An x-ray lithography mask is placed over a glass surface, followed by exposure of the mask and glass surface to soft x-rays. Portions of the mask absorb the soft x-rays while other portions of the mask, corresponding to circuit elements, allow the soft x-rays to strike the glass surface. The soft x-rays striking the glass surface cause the glass surface to darken, thereby forming an image of the circuit pattern in the glass surface corresponding to the stenciled circuit in the mask. An inspection of the image can reveal any defects in the x-ray lithography mask.
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Church Craig E.
University of Hawai'i
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