Method of shadow printing exposure

Radiant energy – Means to align or position an object relative to a source or...

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2504922, H01J 3700

Patent

active

043341560

ABSTRACT:
A method of pattern exposing an energy beam sensitive target surface to a particle beam by proximity printing, wherein mask alignment errors such as lateral deviations, skew and linear distortions are determined and are effectively corrected by scanning the mask area being transferred with a controllably tilted particle beam, the particle beam having a diameter which is small compared to the area of the mask being scanned. At each scan point the particle beam is controllably tilted in the same azimuth direction as the alignment error for that point and by a tilt angle (taken with respect to the normal direction of the target surface) which has a tangent equal to the product of the magnitude of the alignment error and the separation between the mask and target surface at that point.

REFERENCES:
patent: 3745358 (1973-07-01), Firtz et al.
patent: 3876883 (1975-04-01), Broers
patent: 3914608 (1975-10-01), Malmberg
patent: 4136285 (1979-01-01), Anger et al.
patent: 4145615 (1979-03-01), Sumi
patent: 4169230 (1979-09-01), Bohlen et al.

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