Method of separating .sup.15 N from natural abundance NO

Details Method of separating .sup.15 N from natural abundance NO Method of separating .sup.15 N from natural abundance NO

1980-05-29

1983-06-07

Kyle, Deborah L.

Chemistry: electrical and wave energy

Processes and products

Processes of treating materials by wave energy

B01D 5900

Patent

active

043870104

ABSTRACT:
A method of separating and concentrating the .sup.15 N isotope from natural abundance nitric oxide (NO) comprising mixing natural abundance nitric oxide in an appropriate mole ratio with carbon dioxide (CO.sub.2); irradiating the NO--CO.sub.2 mixture with coherent laser light of a desired wavelength, thereby selectively exciting the nitric oxide species containing the .sup.15 N isotope, which subsequently reacts with the carbon dioxide to form nitrogen dioxide (.sup.15 NO.sub.2); and separating said nitrogen dioxide (.sup.15 NO.sub.2) from the gas mixture.

REFERENCES:
patent: 4064025 (1977-12-01), Chen
patent: 4076606 (1978-02-01), Suzuki et al.
patent: 4110182 (1978-08-01), Stevens
patent: 4193855 (1980-03-01), Tuccio
patent: 4202741 (1980-05-01), Hartford, Jr. et al.
Cohen et al., "Reaction of NO(A.sup.2 .SIGMA.+) with Carbon Dioxide", J. s. Chem. 71 (3) 558-63 (Feb. '67).
Lin, "A New Laser Photochemical Process for Isotope Enrichment", Spec. Lett. 8 (11) pp. 901-913 (1975).
Letokhov, "Photophysics and Photochemistry", Phys. Today, May 1977, pp. 23-32.
Basov et al., "Isotope Separation in Laser-Stimulated Chem. Reactions", JETP Lett. 20 (9) pp. 277-278 (1974).

Affiliated with

Also associated with

Rating

Method of separating .sup.15 N from natural abundance NO does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of separating .sup.15 N from natural abundance NO, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of separating .sup.15 N from natural abundance NO will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2342273