Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating
Patent
1983-07-11
1986-04-01
Metz, Andrew H.
Chemistry: electrical and wave energy
Processes and products
Vacuum arc discharge coating
118715, 204298, 427 38, C23C 1454
Patent
active
045796394
ABSTRACT:
A method of sensing the amount of a thin film deposited during an ion plating process, based upon either fixing the value of voltage applied to a plasma-generating probe and measuring the current which flows through the probe into the plasma, this current varying in proportion to the rate of formation of the thin film, or fixing the level of current which flows through the probe into the plasma at a fixed value and measuring the voltage which develops at the probe, this voltage varying in proportion to the rate of formation of the thin film. The results of such measurement can be used to control the thickness of a deposited thin film to a desired value.
REFERENCES:
patent: 3670693 (1972-06-01), Rorick et al.
patent: 3734620 (1973-05-01), Cade
patent: 4399013 (1983-08-01), Sugita et al.
D. M. Mattox, Fundamentals of Ion Plating, J. Vac. Sci. Technol., vol. 10, No. 1, Jan./Feb. 1973, pp. 47-52.
Kennedy et al., Gas-Scattering and Ion-Plating Deposition Methods, Research/Development, Nov. 1971, pp. 40-44.
J. J. Bessot, New Vacuum Deposition Techniques, Metal Finishing, Mar. 1980, pp. 64-66.
Enomoto Mitsugu
Koshi Masao
Yoshikawa Yoji
Citizen Watch Company Limited
Leader William T.
Metz Andrew H.
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