Method of selecting pattern to be measured, pattern...

Details Method of selecting pattern to be measured, pattern... Method of selecting pattern to be measured, pattern...

2006-07-11

2006-07-11

Le, Que T. (Department: 2878)

Radiant energy

Photocells; circuits and apparatus

With circuit for evaluating a web, strand, strip, or sheet

Reexamination Certificate

active

07075098

ABSTRACT:
A method of selecting a pattern to be measured includes selecting only points from a combination of all factors effecting dimensional fluctuations. For example, fluctuation between wafers, fluctuation in a wafer, and fluctuation in a chip are candidates for measurement points of patterns to be measured. Further, the number of the selected points corresponds to a divisor of the combination of all factors.

REFERENCES:
patent: 6456736 (2002-09-01), Su et al.
patent: 6788996 (2004-09-01), Shimizu
patent: 10-144743 (1998-05-01), None
patent: 2001-274209 (2001-10-01), None

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