Method of sealing of ceramic wall structures

Coating processes – Coating by vapor – gas – or smoke – Base includes an inorganic compound containing silicon or...

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4272551, 4272552, C23C 1100, C23C 1300

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045017778

ABSTRACT:
A method of sealing the pores in wall structures formed of sintered ceramic owders, especially silicon nitride or silicon carbide. The sealing operation is performed by pumping two reactant gases into the pores of the wall structure from opposite sides of the structure. As the gases meet one another within the pores they chemically react to form a solid ceramic sealant material, e.g., silicon nitride or silicon carbide. The reactant gases are selected so that the in situ-formed sealant corresponds chemically to the wall structure material.

REFERENCES:
patent: 3578495 (1971-05-01), Pammer et al.
patent: 3798061 (1974-03-01), Yamazaki
patent: 4089992 (1978-05-01), Doo et al.
patent: 4196233 (1980-04-01), Bitzer et al.
patent: 4374163 (1983-02-01), Isenberg

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