Method of repetitively imaging a mask pattern on a substrate, an

Details Method of repetitively imaging a mask pattern on a substrate, an Method of repetitively imaging a mask pattern on a substrate, an

1995-05-25

1997-09-30

Grimley, Arthur T.

Photocopying

Projection printing and copying cameras

Step and repeat

355 55, 355 61, 355564, 355 56, 356401, G03B 2742

Patent

active

056731019

ABSTRACT:
A method and apparatus for repetitively imaging a mask pattern (C) on a substrate (W) are described. Various parameters of the apparatus and the projection lens system (PL) can be measured accurately and reliably and measuring devices of the apparatus can be calibrated by measuring a latent image of a mark by means of a scanning microscope (LID) forming a diffraction-limited radiation spot (Sp) on the photoresist layer on the substrate (W), in which layer the latent image is formed by means of a projection beam (PB).

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J. Wangler & J. Liegel, "Design principles for an illumination system using an excimer laser as a light source", SPIE vol. 1138, 1989, pp. 129-136.

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