Method of repairing pit defect and salient defect of...

Details Method of repairing pit defect and salient defect of... Method of repairing pit defect and salient defect of...

2006-05-09

2006-05-09

Chowdhury, Tarifur R. (Department: 2871)

Liquid crystal cells, elements and systems

Nominal manufacturing methods or post manufacturing...

Defect correction or compensation

C349S032000

Reexamination Certificate

active

07042547

ABSTRACT:
An inspection process is performed to determine defects of an electrode pattern. A first repairing process is performed to fill the pit part, and a second repairing process is performed to remove the salient part. The first repairing process utilizes a conductive paste to fill the pit part of the electrodes, and the second repairing process utilizes a laser beam to remove the salient part of the electrode pattern so that the electrodes can discharge normally.

REFERENCES:
patent: 6479120 (2002-11-01), Miyaji
patent: 6856305 (2005-02-01), Nagano
patent: 6870371 (2005-03-01), Park et al.
patent: 10297128 (1998-11-01), None
patent: 11-25853 (1999-01-01), None
patent: 2000-068629 (2000-03-01), None
patent: 2000-348623 (2000-12-01), None
patent: 2001-107101 (2001-04-01), None

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