Method of repairing an opaque defect on a mask with electron...

Details Method of repairing an opaque defect on a mask with electron... Method of repairing an opaque defect on a mask with electron...

2005-05-24

2005-05-24

Niebling, John F. (Department: 2812)

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

Reexamination Certificate

active

06897157

ABSTRACT:
The present invention discloses a method of fabricating and repairing a mask without damage and an apparatus including a holder to mount a substrate; a stage to position the holder in a chamber; a pumping system to evacuate the chamber; an imaging system to locate an opaque defect in the substrate; a gas delivery system to dispense a reactant gas towards the defect; and an electron delivery system to direct electrons towards the opaque defect.

REFERENCES:
patent: 5741557 (1998-04-01), Corbin et al.
patent: 5973295 (1999-10-01), Corbin et al.
patent: 6042738 (2000-03-01), Casey, Jr. et al.
patent: 6340543 (2002-01-01), Nagamura et al.
patent: 6548417 (2003-04-01), Dao et al.
patent: 6583098 (2003-06-01), Cassie
patent: 6610447 (2003-08-01), Yan et al.

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