Method of repairing a defective photomask

Details Method of repairing a defective photomask Method of repairing a defective photomask

1978-09-05

1980-04-29

Newsome, John H.

Coating processes

Electrical product produced

Welding electrode

427 10, 427140, 427142, B05D 306

Patent

active

042006686

ABSTRACT:
A method of repairing pin holes in a defective photomask such as one comprising a patterned chromium film on a glass substrate comprises depositing an adhesion promoting film such as siloxane on the surface of the photomask, then depositing a solvent soluble layer such as a photoresist layer over the adhesion promoting layer, a window is then formed through the layers and underlying photomask in the area of the pin hole by burning through these layers by means of a laser. The exposed areas of the window are etched and a metallic film is deposited over the exposed surfaces. Finally, the photomask is treated with solvent for removing the solvent soluble photoresist which also causes the metal film deposited thereon to be removed in all areas except the area of the window.

REFERENCES:
patent: 2447836 (1948-08-01), Beeber et al.
patent: 3650796 (1972-03-01), Jackson et al.
patent: 3748975 (1973-07-01), Tarabocchia
patent: 4107351 (1978-08-01), James et al.
Smith et al., "IBM Tech. Disc. Bull.", v. 11, No. 9, p. 1151, Feb. 1969.
Hawkins et al., "IBM Tech. Disc. Bull.", v. 12, No. 6, p. 735, Nov. 1969.
Fugardi, "IBM Tech. Disc. Bull.", v. 14, No. 10, p. 2855, Mar. 1972.
Thompson et al., "J. Electrochem. Soc. Solid State Sci. and Tech.", vol. 120, No. 12, pp. 1722-1726.

Affiliated with

Also associated with

Rating

Method of repairing a defective photomask does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of repairing a defective photomask, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of repairing a defective photomask will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1684225