Method of removing organic flux using peroxide composition

Details Method of removing organic flux using peroxide composition Method of removing organic flux using peroxide composition

1990-08-27

1993-12-14

Morris, Theodore

Cleaning and liquid contact with solids

Processes

For metallic, siliceous, or calcareous basework, including...

134 1, 134 26, 134 27, 134 29, 134 40, C23G 100, C23G 114

Patent

active

052698505

ABSTRACT:
A composition for removing organic contaminants, such a flux residues, from a solid substrate comprises: (a) hydrogen peroxide in the amount of about 3 to 5 percent by weight of the composition; (b) an alkaline compound in sufficient amount to provide a pH of at least 10.5 in the composition; (c) about 0.1 to 0.3 percent by weight of a chosen wetting agent which is unreactive with the hydrogen peroxide and the alkaline compound; and (d) purified water as the balance of the composition. Optionally, the composition may further comprise about 0.5 to 2.0 percent by weight of a chosen metal protective agent.
The solid substrate having organic contaminants thereon is exposed to the above noted composition whereby the organic contaminants are removed from the substrate and are converted into non toxic and non-hazardous products. Thus, negative environmental impact is avoided by the present process. In an alternative embodiment, the organic contaminant removal is further enhanced by exposing the composition and the organic contaminants on the substrate to ultraviolet radiation.

REFERENCES:
patent: 3672823 (1972-06-01), Boucher
patent: 4226640 (1980-10-01), Bertholdt
patent: 4270957 (1981-06-01), Donakowski et al.
patent: 4304762 (1981-12-01), Leigh
patent: 4497725 (1985-02-01), Smith et al.
patent: 4604144 (1986-08-01), Wong
patent: 4612142 (1986-09-01), Piorr et al.
patent: 4950359 (1990-08-01), Parissi et al.

Affiliated with

Also associated with

Rating

Method of removing organic flux using peroxide composition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of removing organic flux using peroxide composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of removing organic flux using peroxide composition will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1701758