Method of removing noxious substances from gases

Details Method of removing noxious substances from gases Method of removing noxious substances from gases

1984-11-13

1986-09-16

Doll, John

Chemistry of inorganic compounds

Modifying or removing component of normally gaseous mixture

423240, 423241, 423220, 423224, 423278, 423573G, 55 72, B01D 5300

Patent

active

046121749

ABSTRACT:
Waste gases and other noxious substances which are formed in connection with chemical processes and the manufacture of devices such as semiconductors and covalent hydrides and element organic compounds, etc. are treated so as to remove the noxious components. The inventive method removes noxious components from substances including waste gases one group or part of said noxious components containing covalent hydrides and element-organic compounds and another group or part of said noxious components containing halogens, halogens in aqueous solutions, and acid compounds such as hydrogen halides and pseudohalides; which removal comprising: oxidizing noxious components of said one group or part in a first stage and a spontaneous reaction by means of one of:

REFERENCES:
patent: 3579305 (1971-05-01), Neti
patent: 3607004 (1971-09-01), Deschamps et al.
patent: 4066739 (1978-01-01), Chen
patent: 4094962 (1978-06-01), Cocuzza
patent: 4355010 (1982-10-01), Jodden et al.
patent: 4442077 (1984-04-01), Foster et al.

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