Method of removing material from a surface in a vacuum chamber

Details Method of removing material from a surface in a vacuum chamber Method of removing material from a surface in a vacuum chamber

1992-04-20

1994-05-03

Paschall, Mark H.

Electric heating

Metal heating

By arc

2191214X, 156345, 156646, 20429834, B23K 900

Patent

active

053089502

ABSTRACT:
In order to remove material from the surfaces in a vacuum chamber it is proposed to activate hydrogen gas in a plasma with the aid of a low voltage arc discharge which is supported by a hot emitting electrode in a cathode chamber. The removing method allows the cleaning of surfaces onto which subsequently safely adhering layers of a highest purity can be precipitated. The method can also be used for cleaning vacuum chambers. The small expenditures regarding apparatuses with the high rates of removal to be obtained produce a highly economical practicing of the method.

REFERENCES:
patent: 4122292 (1978-10-01), Karinsky
patent: 4123316 (1978-10-01), Tsuchimoto
patent: 4277304 (1981-07-01), Horiike et al.
patent: 4574179 (1986-03-01), Masuzawa et al.
patent: 4664747 (1987-05-01), Sekigucyi et al.
"In situ removal native oxide from silicon wafers", Sherman, J. Vac. Sci. Technol. Jul./Aug. 1990; pp. 656-657.

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