Cleaning and liquid contact with solids – Processes – For metallic – siliceous – or calcareous basework – including...
Patent
1985-11-27
1987-05-19
Hruskoci, Peter
Cleaning and liquid contact with solids
Processes
For metallic, siliceous, or calcareous basework, including...
134 3, 134 28, 134 41, 252 82, 252 87, C23G 118
Patent
active
046665285
ABSTRACT:
A method of removing iron and copper containing scale from a metal surface by contacting the scale with a composition comprising an admixture of an aminopolycarboxylic acid, such as ethylenediaminetetraacetic acid (EDTA), or the alkali metal salts or ammonium salts or amine salts of the aminopolycarboxylic acid and a phosphonic acid such as aminotrimethylenephosphonic acid (ATMP), or an alkali metal salt or amine salt or ammonium salt of the phosphonic acid. The aminopolycarboxylic acid or salt thereof and phosphonic acid of salt thereof are present in the composition in an amount sufficient to provide a molar ratio of aminopolycarboxylic acid to phosphonic acid in the range of from about 1:9 to about 39:1.
REFERENCES:
patent: 3308065 (1967-03-01), Lesinski
patent: 3438811 (1969-04-01), Harriman et al.
patent: 3447965 (1969-06-01), Teumac
patent: 3804770 (1974-04-01), Lorenc et al.
patent: 3854996 (1974-12-01), Frost et al.
patent: 3996062 (1976-11-01), Frost et al.
patent: 4387027 (1983-06-01), May et al.
patent: 4452643 (1984-06-01), Martin et al.
patent: 4578162 (1986-03-01), McIntyre et al.
Arrington Stephen T.
Bradley Gary W.
Halliburton Company
Hruskoci Peter
Kent Robert A.
Sherer Edward
LandOfFree
Method of removing iron and copper-containing scale from a metal does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of removing iron and copper-containing scale from a metal, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of removing iron and copper-containing scale from a metal will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1562405