Method of removing contaminants from a double-ended arc...

Details Method of removing contaminants from a double-ended arc... Method of removing contaminants from a double-ended arc...

2005-12-06

2005-12-06

Williams, Joseph (Department: 2879)

Electric lamp and discharge devices

With gas or vapor

Having electrode lead-in or electrode support sealed to...

C313S634000

Reexamination Certificate

active

06972520

ABSTRACT:
A method of removing contaminants from a double-ended arc discharge tube includes the steps of providing at least one capillary channel at each end of the tube, where the ends of the tube are sealed closed except at the capillary channels, and introducing a flushing gas into the tube through one capillary channel at one end of the tube and removing the flushing gas and contaminants through another capillary channel at another end of the tube. During manufacture, the double-ended arc discharge tube has a sealed electrode and an open capillary channel at each end of the tube.

REFERENCES:
patent: 3685880 (1972-08-01), Sobieski
patent: 4310774 (1982-01-01), Karlotski et al.
patent: 4540373 (1985-09-01), Rothwell et al.
patent: 4959587 (1990-09-01), Schug
patent: 5037342 (1991-08-01), Barthelmes et al.
patent: 5087218 (1992-02-01), Ahlgren et al.
patent: 5138227 (1992-08-01), Heider et al.
patent: 5176558 (1993-01-01), Newell
patent: 5213536 (1993-05-01), Hough et al.
patent: 5343117 (1994-08-01), Wyner et al.
patent: 5468168 (1995-11-01), Balaschak et al.
patent: 5825129 (1998-10-01), Van der Leeuw et al.
patent: 5877591 (1999-03-01), Nagata et al.
patent: 5936349 (1999-08-01), Fukai et al.
patent: 5984749 (1999-11-01), Nishibori et al.
patent: 5986403 (1999-11-01), Jansen et al.
patent: 6004503 (1999-12-01), Neil
patent: 6135840 (2000-10-01), Kanzaki
patent: 6354901 (2002-03-01), Bundo et al.
patent: 6368175 (2002-04-01), Horiuchi et al.
patent: 6547619 (2003-04-01), Ohkawai et al.
patent: 6612892 (2003-09-01), Lamouri et al.

Affiliated with

Also associated with

Rating

Method of removing contaminants from a double-ended arc... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of removing contaminants from a double-ended arc..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of removing contaminants from a double-ended arc... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3496791