Method of removing coated film from substrate edge surface and a

Details Method of removing coated film from substrate edge surface and a Method of removing coated film from substrate edge surface and a

1998-01-23

1999-08-17

Bell, Janyce

Coating processes

Centrifugal force utilized

118 52, 118 64, 427336, 4273855, 427294, 431231, B05D 312, B05C 1102

Patent

active

059391391

ABSTRACT:
A method of removing a coated film from an edge surface of a substrate comprising the steps of (a) forming an insulating film for protecting a circuit pattern of a substrate by pouring an insulating resin solution on a circuit-pattern formation surface of the substrate, (b) rotating the substrate having the insulating film coated thereon, (c) removing the insulating film by pouring a solvent on the edge surface of the substrate, while the substrate is being rotated, and (d) accelerating dehydration of the insulating film by taking at least one action of spraying a gas to the edge surface of the substrate and performing a local evacuation of a region in the proximity of the edge surface of the substrate while the substrate is being rotated.

REFERENCES:
patent: 5658615 (1997-08-01), Hasebe et al.
patent: 5688555 (1997-11-01), Teng
patent: 5718763 (1998-02-01), Tateyama et al.

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