Method of regeneration of spent etching solutions

Details Method of regeneration of spent etching solutions Method of regeneration of spent etching solutions

1977-02-09

1978-08-15

Prescott, Arthur C.

Chemistry: electrical and wave energy

Processes and products

Processes of treating materials by wave energy

204 52R, 204 94, 204107, 204112, 204149, C25C 112, C25C 106

Patent

active

041070119

ABSTRACT:
The present invention is concerned with a method of regeneration of spent etching solutions containing cupric chloride and a metal chloride: cuprous chloride or ferrous chloride. These solutions are subjected to electrolysis with copper being reduced at the cathode and the metal chloride being oxidized at the anode. At the same time, chlorine is liberated at the anode, which is used for additional oxidation of the chloride of a metal.
The proposed method permits effective regeneration of etching solutions without polluting the environment.

REFERENCES:
patent: 2748071 (1956-05-01), Eisler
patent: 2865823 (1958-12-01), Harris et al.
patent: 2964453 (1960-12-01), Garn et al.
patent: 3761369 (1973-09-01), Tirrell
patent: 3788915 (1974-01-01), Gulla

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